Diplomarbeit am Institut für Mikroelektronik

Bezahlte Elektrotechnik-Diplomarbeitsstelle:

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Simulation of Lithography Processes in Semiconductor Manufacturing
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Lithography is considered one of the major challenges, if not the main
challenge, for future semiconductor technology as scaling continues
(MPU printed gate length: 2007 ... 42nm, 2010 ... 30nm).  According to
the ITRS (International Technology Roadmap for Semiconductors),
predictive lithography simulation and well-planned experiments will
help to reduce the rise of process development costs and speed the
process development cycle.  In the near future, a critical assessment
of the various lithography options (most importantly 193nm immersion
lithography and EUV) by simulation is considered an important
contribution.

In the master's thesis, numerical methods for rigorous electromagnetic
analysis are discussed and critically evaluated.  Simulations of
leading examples are performed using a simulation tool developed at
our institute, and improvements to the tool are implemented.

Our institute is internationally renowned for its contributions to the
modeling and simulation of semiconductor manufacturing processes and
devices.

Students should have programming skills (C, C++, etc.) and a
background or strong interest in numerics and simulation.

Für weitere Informationen und bei Interesse kontaktieren Sie mich
bitte per Email.  Nach der Diplomarbeit besteht die Möglichkeit
einer weiteren Anstellung im Rahmen einer Dissertation.

Mit freundlichen Grüßen,
Clemens Heitzinger
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Dipl.-Ing. Dr. techn. Clemens Heitzinger
Institute for Microelectronics
Technical University of Vienna, Austria
Phone: +43(1)58801/36026
Fax: +43(1)58801/36099
Email: Clemens (dot) Heitzinger (at) TUWien (dot) ac (dot) at
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